| 摘要 |
<p>PURPOSE:To obtain a duplicable photosensitive white film usable for applying it to a reflective original and serviceable as a photograph mount by coating a transparent support with a white photosensitive resist layer. CONSTITUTION:The transparent support is coated with the white photosensitive resist layer, and this layer is polymerized, cross-linked, dimerized, broken in the cross-links, decomposed, transarranged, etc., by irradiation of light, resulting in changing solubility in solvents, and it is selected by considering photoreactivity, developability, storage stability, film strength after photohardening, safety, etc. As a result, modified polyvinylalcohol, etc., are selected as a water-developable photoresist good in miscibility with white pigments.</p> |
