发明名称 TUNNEL DIODE ELEMENT
摘要 PURPOSE:To obtain enhanced non-linear characteristics even at room temperature by employing a composition in which there is a difference in energy between band gaps of the second and third semiconductor layers. CONSTITUTION:The unsymmetry of potential barriers 1 and 2 can be obtained by changing a value of x in AlxGa1-xAs. For example, when the values of x of the barrier layers 1 and 2 are selected to be 0.6 and 0.3 respectively, a height of the potential barrier becomes high on the AlGaAs layer 1 and low on the layer 2. Three layers of the potential barrier layers 1 and 2, and a potential well layer 3 are grown to a thickness of 50-70Angstrom respectively on the GaAs layer 4 doped with an impurity which is to be an electrode layer by an MBE method. Further on those, either of the GaAs electrode layers 5 which is doped with an impurity similarly is formed thereby forming an element part. The negative and positive voltage V are applied to the left electrode layer 4 and the right electrode layer 5 respectively and the effective unsymmetry of the barriers is enhanced as shown by the drawing.
申请公布号 JPS61176163(A) 申请公布日期 1986.08.07
申请号 JP19850018049 申请日期 1985.01.31
申请人 FUJITSU LTD 发明人 OHORI TATSUYA
分类号 H01L29/88;(IPC1-7):H01L29/88 主分类号 H01L29/88
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