发明名称 MEASUREMENT OF SUBSTRATE TEMPERATURE
摘要 PURPOSE:To make it feasible to measure the substrate temperature accurately by means of an infrared ray detector by a method wherein a plate type body with diffraction grating grooves reflecting detection wavelength band of an infrared ray detector is provided between a semiconductor crystal substrate and a heater. CONSTITUTION:Any heat of substrate and specific light of a heater are prevented from entering into an infrared ray thermometer by shielding the infrared rays with a plate type body with diffraction grating grooves between a substrate and a heater. For example, a substrate loading sheet 11 mode of sapphire is formed of diffraction grating grooves 12 to be provided with transmittivity characteristics wherein the transmittivity 1 is attenuated within the range of + or -1mum with maximum wavelength x of 2mum to completely shield the infrared rays from heater side within the wavelength band. Through these procedures, the detecting sensitivity characteristics of infrared ray detector may be represented by the dotted line making it feasible to measure the sub strate temperature accurately within the range of 400-800 deg.C by means of the infrared ray detector.
申请公布号 JPS61176131(A) 申请公布日期 1986.08.07
申请号 JP19850018048 申请日期 1985.01.31
申请人 FUJITSU LTD 发明人 SAITO JUNJI
分类号 G01J5/02;G01J5/00;G01J5/06;H01L21/66 主分类号 G01J5/02
代理机构 代理人
主权项
地址