Contact printing mask alignment apparatus for semiconductor wafer geometry,申请号US19650428494-传众专利搜索

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发明名称	Contact printing mask alignment apparatus for semiconductor wafer geometry
摘要
申请公布号	US3220331(A)	申请公布日期	1965.11.30
申请号	US19650428494	申请日期	1965.01.27
申请人	KULICKE AND SOFFA MANUFACTURING COMPANY	发明人	EVANS JAMES A.;TANCREDI HENRY;JR. FREDERICK W. KULICKE,
分类号	G03F7/20;H01L21/68	主分类号	G03F7/20
代理机构		代理人
主权项
地址

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