发明名称 VACUUM DISCHARGE TREATING DEVICE
摘要 PURPOSE:To dissolve trouble by making an insulating substance film deposite on the surface side of the anode electrode and to enable to perform a treatment according to vacuum discharge over a long time by a method wherein a plate made of the same insulating substance as an insulating substance constituting the insulating substance film, which is deposited on the surface side of the anode electorde, is provided on the surface of the anode electrode and an inductance is inserted in the circuit leading to the earth from the anode electrode. CONSTITUTION:A plate 7 made of an insulating substance that is sufficiently thicker than the film thickness of a film made of the insulating substance, which is anticipated to be deposited on the surface side of an anode electrode 3, is mounted on the surface of the anode electrode 3. Moreover, a variable or fixed inductance 9 to adjust the impedance of a capacitance negating circuit 8, which is generated with the mounting of the plate 7, into 0 or proper value is inserted in the circuit 8 leading to an earth 5 from the anode electrode 3. It is desirable that such the plate 7 is one made of the same insulating substance as an insulating substance constituting a film, which is deposited on the surface side of the anode electrode 3. For example, when a film made of SiO2 is anticipated to be deposited on the surface side, a plate made of the SiO2 is adopted as the plate 7.
申请公布号 JPS61174633(A) 申请公布日期 1986.08.06
申请号 JP19850013496 申请日期 1985.01.29
申请人 ULVAC CORP 发明人 NAKAYAMA IZUMI;OBINATA HISAHARU
分类号 H01L21/205;C23F4/00;H01L21/302;H01L21/3065 主分类号 H01L21/205
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