发明名称 |
TREATMENT OF WASTE GAS CONTAINING HALOGENOHYDROCARBON |
摘要 |
<p>PURPOSE:To decompose the halogenohydrocarbon contained in a waste gas and to remove it by passing the waste gas through the inside of a heat-treating pipe heated in the specified temp. and above for the specified hour and above. CONSTITUTION:In case of performing the gas phase reaction such as a chemical vapor deposition method by using a halogenohydrocarbon, a gaseous mixture A of a gas contg. the halogenohydrocarbon and a carrier gas is introduced into a reaction chamber 10 decompressed by a vacuum pump 8 and allowed to react by heating directly a substrate 2 with a high frequency induction coil 3 to stick a deposit B on the substrate 2. The waste gas contg. the nonreacted halogenohydrocarbon passing through the reaction chamber 10 is passed in a spiral tube 4 heated at >=600 deg.C by an electric furnace 5 for >=1sec. In this process, it is decomposed into the fine carbon powder and hydrogen halide and the fine carbon powder is removed with a filter 6 and the exhaust gas G is discharged by the vacuum pump 8.</p> |
申请公布号 |
JPS61174928(A) |
申请公布日期 |
1986.08.06 |
申请号 |
JP19850015809 |
申请日期 |
1985.01.30 |
申请人 |
HITACHI CHEM CO LTD |
发明人 |
HIRAI KEIZO;AIBA YASUHIRO |
分类号 |
B01D53/70;B01D53/34;B01D53/68 |
主分类号 |
B01D53/70 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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