发明名称 |
Water developable photosensitive resinous composition |
摘要 |
A water developable photosensitive resin composition comprising a water soluble polymer, photopolymerizable unsaturated monomer(s) and a photopolymerization initiator, which is characterized in that as the whole or a part of said photopolymerizable unsaturated monomer(s), there is employed a product made by mixing of 1 mole of urea, thiourea or an alkyl derivative thereof and 0.75 to 1.3 moles of an N-alkylol acryl amide or an N-alkylol methacrylamide. The composition is useful for an image formation through a photopolymerization reaction and developable by water treatment to give a soft and rubber like resilient cured product.
|
申请公布号 |
US4604343(A) |
申请公布日期 |
1986.08.05 |
申请号 |
US19850744293 |
申请日期 |
1985.06.13 |
申请人 |
NIPPON PAINT CO., LTD. |
发明人 |
SAKURAI, KIYOMI;KONISHI, KATSUZI |
分类号 |
C08F291/18;G03F7/027;(IPC1-7):G03C1/68 |
主分类号 |
C08F291/18 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|