发明名称 Water developable photosensitive resinous composition
摘要 A water developable photosensitive resin composition comprising a water soluble polymer, photopolymerizable unsaturated monomer(s) and a photopolymerization initiator, which is characterized in that as the whole or a part of said photopolymerizable unsaturated monomer(s), there is employed a product made by mixing of 1 mole of urea, thiourea or an alkyl derivative thereof and 0.75 to 1.3 moles of an N-alkylol acryl amide or an N-alkylol methacrylamide. The composition is useful for an image formation through a photopolymerization reaction and developable by water treatment to give a soft and rubber like resilient cured product.
申请公布号 US4604343(A) 申请公布日期 1986.08.05
申请号 US19850744293 申请日期 1985.06.13
申请人 NIPPON PAINT CO., LTD. 发明人 SAKURAI, KIYOMI;KONISHI, KATSUZI
分类号 C08F291/18;G03F7/027;(IPC1-7):G03C1/68 主分类号 C08F291/18
代理机构 代理人
主权项
地址