| 摘要 |
PURPOSE:To reform efficiently the surface layer of a work including the inside wall surface of the deep hole of the work with a non-distortion treatment by irradiating an ion beam to a target and driving sputtering particles form the target toward the surface for vapor deposition of the work. CONSTITUTION:A driving and supporting device 60 is disposed in a vacuum chamber 10 provided with a vacuum pump 20 and an ion beam generator 3 to support the work 50 and the target 70 inserted into the hole part of the work 50 is held rotatably 62 and movably 61 in the axial direction to constitute a device for reforming the surface of the work. The ion beam 40 is irradiated by the generator 30 to the diagonally cut surface of the target 70 to implant ions and to drive out the sputtering particles so as to stick the same approximately perpendicularly to the inside wall surface of the hole of the work 50. The target 70 is rotated 62 and moved 61 by the device 60. The film is thus formed on the inside wall of the hole of the work 50 and the surface thereof is reformed.
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