| 摘要 |
<p>PURPOSE:To obtain a good contrast, and also to make a titled device contribute to the damage prevention of an IC for constituting a driving circuit, by covering at least one of a pair of electrodes for applying an electric field to a liquid crystal layer which is placed so as to be opposed to the inner surface of a liquid crystal display cell, with a silicon nitride film. CONSTITUTION:On a glass substrate 1, for instance, indium oxide is vapor- deposited as a transparent electrode 2 by a vacuum vapor-depositing method. Subsequently, the transparent electrode is coated with a photoresist, an exposure development is executed by a prescribed pattern, and etching is executed by the chloro-solution of hydrochloric acid-chloride. Thereafter, by peeling off the resist by acetone, a patterned transparent electrode 2 is obtained. Next, a conductive part of an electrode leading-out part is covered with a glass mask or a metallic mask, and a silicon nitride film 12 is formed by a P-CVD method. As for the obtained silicon nitride film, its hardness is high and its dielectric constant is about 6.5, and it becomes a film having a high optical transmittivity. Also, on said film, an organic oriented layer 3 consisting of a polyimide film is accumulated.</p> |
