发明名称 DEVICE FOR CHEMICAL VAPOR DEPOSITION
摘要 PURPOSE:To improve a step coverage by introducing a material gas vertically to the substrate. CONSTITUTION:A nozzle 1 is formed into T-shape by its cross section and the gas outlets face wafers 3. As a result, the material gas is introduced vertically to the wafers 3 and by introducing the material gas vertically to the substrate, a step coverage is improved by about 20%.
申请公布号 JPS61170020(A) 申请公布日期 1986.07.31
申请号 JP19850010104 申请日期 1985.01.23
申请人 NEC CORP 发明人 KOTANI TOSHIYUKI
分类号 H01L21/205;H01L21/31 主分类号 H01L21/205
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