发明名称 PREPARATION OF THIN SILICONE FILM
摘要 PURPOSE:To prepare thin silicone film having uniform film thickness and having no pinhole by casting and hardening soln. of silicone which is cured at room temp. to prepare polymer film being insoluble in said soln. and having high critical surface tension, then removing the film by dissolving. CONSTITUTION:Silicone being cured at room temp. is dissolved in aliphatic hydrocarbon, aliphatic ether, aliphatic amine, etc., to obtain 0.1-10wt% soln. The soln. is cast on base film having smooth surface being insoluble in the above-described solvents and having by above 18dyn/cm higher critical surface tension than the same of the above-described solvents such as polyacrylonitrile, polycarbonate, polysulfone, etc., to form film, and the film is crosslinked after evaporating the solvent. Further, the base film is dissolved with a solvent dissolving the base film, thus only the base film is removed to form a thin silicone film. The thickness of the silicone film is ca. 0.1-10mu.
申请公布号 JPS61167408(A) 申请公布日期 1986.07.29
申请号 JP19850008485 申请日期 1985.01.22
申请人 ASAHI CHEM IND CO LTD 发明人 TANABE TSUNEAKI;SUZUOKI KAZUHIRO
分类号 B01D53/22;B01D71/70;B29C41/12;B29C41/42;B29K83/00;B29L7/00;C08J5/18 主分类号 B01D53/22
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