METHOD AND DEVICE FOR SUPPLYING LOCALLY PROCESSING FLUID

摘要

PURPOSE:To process effectively only the specific very small processing part while suppressing the influence to the other part as best as possible in the stage of plating or etching the very small part of a work by using a specifically constructed processing fluid injection device and laser light. CONSTITUTION:The device made into the three-layered construction consisting of an outside cylinder 1, an inside cylinder 2 and an inside cylinder 3 from the outside is used for the device for supplying the processing fluid such as plating or etching soln. in order to plate or etch the specific very small part 9 on the surface of the work 8. The central axis of the inside cylinder 3 is disposed right above the part 9 to be processed at a slight spacing therefrom and the processing fluid is supplied from the inside cylinder 3 through an introducing pipe 7; at the same time, the processing fluid and the part 9 is activated by the laser light 11 by which the part 9 is subjected to processing such as plating. The processing fluid enters the cylinder 2 from the bottom end of the cylinder 3 and is discharged therefrom through a discharge pipe 6. Fluid such as air is supplied through an introducing pipe 5 into the cylinder 1 to prevent contact of the processing fluid with the other part except the part 9 by the pressure thereof. Only the part 9 is thus exactly processed.