| 摘要 |
PURPOSE:To enhance exposure efficiency and exposure stability, by providing an opening having a size necessary for passing luminous flux in the vicinity of the condensing point of luminous flux and a separation wall for separating the space between an optical system and an article to be treated. CONSTITUTION:Parallel luminous flux (l) irradiated from a light source 2 is refracted by a convex lens 3 to form an image at the central part of the small opening 6 provided to a separation wall 5 as a light condensing point P. Subsequently, the reactive gas directly above the article 4 to be treated is irradiated to further irradiate the surface of said article 4 to be treated. This irradiated light photochemically converts gas such as SiH4 or Si2H6 to SiO2 to form a film on the surface of the article 4 to be treated. Because the pressure of N2-gas in an upper space A is determined so as to be made higher than the pressure of gas in a lower space B, the N2-gas passes the small opening 6 to be flowed out to a direction (a). Because the pressure of the gas in the lower space B is lower that of the gas in the upper space A, the gas in the lower space B is not flowed to an upward direction. |
