发明名称
摘要 There is provided a method for producing a stencil for use in screen printing which method comprises coating a screen mesh with liquid photopolymerizable composition, imagewise exposing the coated mesh to radiation to polymerize liquid composition on the mesh in the exposed areas, and removing unexposed liquid composition from the mesh to develop the stencil. Suitably the liquid composition is applied with the screen mesh in contact with a protective film and, after imagewise exposure, the stencil is developed by stripping of the film such that unexposed liquid remains on the film. This provides a simple method of producing a stencil which does not require highly skilled personnel.
申请公布号 JPS6131867(B2) 申请公布日期 1986.07.23
申请号 JP19780087785 申请日期 1978.07.20
申请人 KENESU JEEMUSU RIIDO 发明人 KENESU JEEMUSU RIIDO;ARAN RENOTSUKUSU RIITOGOO
分类号 G03F7/40;B29C53/60;B41N1/24;D04H1/64;G03C7/14;G03F7/12;G03F7/30 主分类号 G03F7/40
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