发明名称 Polyacetal resin compositions having improved resistance to deterioration when exposed to light and containing alkylidene bis(benzotriazolyl phenols).
摘要 <p>Polyacetal resin compositions are provided having improved light stability and comprising an alkylidene bis(benzotriazolyl phenol) having the formula: &lt;Chemistry id="chema01" num="0001"&gt;&lt;Image id="ia01" he="27" wi="94" file="IMGA0001.TIF" imgContent="chem" imgFormat="TIFF" inline="no" /&gt;&lt;/Chemistry&gt;wherein: &lt;UnorderedLists id="ula01" listStyle="none"&gt;&lt;ListItem&gt;R, is selected from the group consisting of hydrogen and alkyl having from one to about eleven carbon atoms;&lt;/ListItem&gt;&lt;ListItem&gt;R&lt;Sub&gt;2&lt;/Sub&gt; is selected from the group consisting of alkyl having from one to about twelve carbon atoms; and arylalkyl having from seven to about eighteen carbon atoms; and&lt;/ListItem&gt;&lt;ListItem&gt;X is selected from the group consisting of hydrogen; halogen; alkyl having from one to about twelve carbon atoms; aryl alkyl having from seven to about eighteen carbon atoms; alkoxy having from one to about twelve carbon atoms; phenoxy; arylalkoxy having from seven to about eighteen carbon atoms; and phenyl.&lt;/ListItem&gt;&lt;/UnorderedLists&gt;</p>
申请公布号 EP0188236(A2) 申请公布日期 1986.07.23
申请号 EP19860100241 申请日期 1986.01.09
申请人 ADEKA ARGUS CHEMICAL CO., LTD. 发明人 KUBOTA, NAOHIRO;NISHIMURA, ATSUSHI
分类号 C08L59/00;C08K5/34;C08K5/3475;(IPC1-7):C08K5/34 主分类号 C08L59/00
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