发明名称 |
Polyacetal resin compositions having improved resistance to deterioration when exposed to light and containing alkylidene bis(benzotriazolyl phenols). |
摘要 |
<p>Polyacetal resin compositions are provided having improved light stability and comprising an alkylidene bis(benzotriazolyl phenol) having the formula:
<Chemistry id="chema01" num="0001"><Image id="ia01" he="27" wi="94" file="IMGA0001.TIF" imgContent="chem" imgFormat="TIFF" inline="no" /></Chemistry>wherein:
<UnorderedLists id="ula01" listStyle="none"><ListItem>R, is selected from the group consisting of hydrogen and alkyl having from one to about eleven carbon atoms;</ListItem><ListItem>R<Sub>2</Sub> is selected from the group consisting of alkyl having from one to about twelve carbon atoms; and arylalkyl having from seven to about eighteen carbon atoms; and</ListItem><ListItem>X is selected from the group consisting of hydrogen; halogen; alkyl having from one to about twelve carbon atoms; aryl alkyl having from seven to about eighteen carbon atoms; alkoxy having from one to about twelve carbon atoms; phenoxy; arylalkoxy having from seven to about eighteen carbon atoms; and phenyl.</ListItem></UnorderedLists></p> |
申请公布号 |
EP0188236(A2) |
申请公布日期 |
1986.07.23 |
申请号 |
EP19860100241 |
申请日期 |
1986.01.09 |
申请人 |
ADEKA ARGUS CHEMICAL CO., LTD. |
发明人 |
KUBOTA, NAOHIRO;NISHIMURA, ATSUSHI |
分类号 |
C08L59/00;C08K5/34;C08K5/3475;(IPC1-7):C08K5/34 |
主分类号 |
C08L59/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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