| 发明名称 |
High contrast, high resolution deep ultraviolet lithographic resist composition with diazo carbonyl compound having alpha phosphoryl substitution |
| 摘要 |
A lithographic resin for use with deep ultraviolet radiation comprises a weakly acidic resin and an alpha phosphoryl substituted diazo carbonyl compound as a sensitizer.
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| 申请公布号 |
US4601969(A) |
申请公布日期 |
1986.07.22 |
| 申请号 |
US19850717254 |
申请日期 |
1985.03.28 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CLECAK, NICHOLAS J.;GRANT, BARBARA D.;MILLER, ROBERT D.;TOMPKINS, TERRY C.;WILLSON, CARLTON G. |
| 分类号 |
C08L101/00;C08K5/00;C08K5/53;C08L33/00;C08L33/02;C08L61/10;G03C1/72;G03C5/16;G03F7/016;G03F7/038;G03F7/039;G03F7/20;H01L21/027;(IPC1-7):G03C1/54 |
主分类号 |
C08L101/00 |
| 代理机构 |
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代理人 |
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