发明名称 Method for fabricating a semiconductor gas sensor
摘要 A method for fabricating a solid state semiconductor gas sensor and the semiconductor sensor itself for use in equipment detecting small amounts of H2S. The method of sensor fabrication comprises spray deposition of a mixture of metal oxides mixed together with various metal and non-metal materials which serve in the finished product as activators, dopants, and/or film binder materials, and including in suspension a molecular sieve material, for enhancing porosity on a scale of molecular dimensions in the finished sensor. All of the foregoing materials are suspended in a suitable solution and preferably sprayed onto a heated insulating substrate to form the finished product. The example sensor, capable of selective detection of H2S in air and a sensitivity of less than 1 PPM (part per million), is comprised of a platinum activated alumina, tin oxide, and zeolite molecular sieve material.
申请公布号 US4601914(A) 申请公布日期 1986.07.22
申请号 US19840613193 申请日期 1984.05.23
申请人 AIRTECH, INC. 发明人 BARNES, JAMES O.;LEARY, DAVID J.
分类号 G01N27/12;(IPC1-7):B05D5/12 主分类号 G01N27/12
代理机构 代理人
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