发明名称 |
Method of producing thin-film transistor array |
摘要 |
A method of manufacturing a thin film transistor array is simplified by processes to form source and drain electrodes at least of ITO film for pixel electrodes on a gate insulating film covering gate electrode and to form islands of an amorphous semiconductor film and a light shield film in the same masking process on the source and the drain electrodes.
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申请公布号 |
US4601097(A) |
申请公布日期 |
1986.07.22 |
申请号 |
US19840665773 |
申请日期 |
1984.10.29 |
申请人 |
SEIKO INSTRUMENTS & ELECTRONICS LTD. |
发明人 |
SHIMBO, MASAFUMI |
分类号 |
H01L29/78;G02F1/1335;G02F1/1368;H01L21/336;H01L21/77;H01L21/84;H01L27/12;H01L29/786;(IPC1-7):H01L29/78;G02F1/133 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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