发明名称 Method of producing thin-film transistor array
摘要 A method of manufacturing a thin film transistor array is simplified by processes to form source and drain electrodes at least of ITO film for pixel electrodes on a gate insulating film covering gate electrode and to form islands of an amorphous semiconductor film and a light shield film in the same masking process on the source and the drain electrodes.
申请公布号 US4601097(A) 申请公布日期 1986.07.22
申请号 US19840665773 申请日期 1984.10.29
申请人 SEIKO INSTRUMENTS & ELECTRONICS LTD. 发明人 SHIMBO, MASAFUMI
分类号 H01L29/78;G02F1/1335;G02F1/1368;H01L21/336;H01L21/77;H01L21/84;H01L27/12;H01L29/786;(IPC1-7):H01L29/78;G02F1/133 主分类号 H01L29/78
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