| 摘要 |
<p>PURPOSE:To form a mask holder good in X-ray transmittance by using a mask holder made of a laminate of an Al-N-O type film and an org. film. CONSTITUTION:A silicon oxide films 2 are formed on both sides of a circular silicon wafer 1, a polyimide film 3 is formed on one of the films 2, and a 2mum thick Al-N-O type film 4 is formed on the film 3 by using a thermoelectron impulse type ion plating device. Then, a tar type coating material layer 10 is formed on the film 4, and the circular central part of the disclosed side of the silicon oxide film 2 is removed, and the central part of the disclosed silicon wafer 1 is electrolytically etched. The remaining outer part of the film 2 is also removed. Next, one side of a ring frame 7 is coated with an epoxy type adhesive 8, and bonded to the face of the disclosed silicon wafer 1 reverse to the films 3, 4, and the layer 10 is removed.</p> |
