发明名称 ORNAMENTAL COATING METHOD
摘要 PURPOSE:To reduce the time for irradiation of UV rays and to improve productivity by direct forming a mask for the solvent soluble method consisting of a paint, etc. of a non-transmittivity to UV rays on the coated film curable by UV rays on a base material. CONSTITUTION:The resin curable by UV rays is coated on the base material 1, and the mask 3 for the solvent soluble method consisting of the ink, paint, etc. of the non-transmittivity of UV rays if formed on the coated film 2 by direct printing. The UV rays are then irradiated thereon to cure part of the coated film 2 and thereafter the uncured part is dissolved away. A pattern forming material 5 is packed into the recesses 4 of the coated film 2 formed after said part is dissolved away. More specifically, the time for irradiation of the UV rays is reduced and the productivity is improved by forming the mask by direct printing, etc. on the coated film curable by UV rays on the base material. since the mask material is thin and is free from thermal deforma tion by the irradiation, the formation of the pattern with high accuracy is made possible. The mask is formed by printing, etc. and therefore the method is suitable for mass production or production of diversified kinds and is also applicable onto stock having a curved surface.
申请公布号 JPS61161180(A) 申请公布日期 1986.07.21
申请号 JP19850002786 申请日期 1985.01.11
申请人 NIPPON GAKKI SEIZO KK 发明人 KATO SHINJI;KAWASHIMA JUNJI
分类号 B05D5/06;B05D1/32;B05D3/06 主分类号 B05D5/06
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