发明名称 SAMPLE PROCESSOR
摘要 PURPOSE:To enable the improvement in deposition speed of thin films, cost reduction, etc. by enhancing the efficiency of utilizing the raw material gas by a method wherein a plurality of apertures are provided in an intermediate electrode arranged between the anode and cathode. CONSTITUTION:An intermediate electrode 18 is provided between a gas introduction ring pipe 12 and an electrode 2 on which a sample substrate 5 is mounted. The electrode 18, made of a metallic plate, is provided with a plurality of apertures 17 and set at the same ground potential as that of the electrode 2 on which the sample substrate 5 is mounted. Thus providing an intermediate electrode having apertures can enhance the efficiency of decomposing the raw material gas by the effective increase of electrolysis in the container. Besides, the intermediate electrode is effective in inhibiting the exhaust of an unreacting gas under the condition of unreaction. As a result, the active seed is effectively produced: for example, high deposition speed can be obtained in application for the deposition of e.g. a-Si:H films.
申请公布号 JPS61160927(A) 申请公布日期 1986.07.21
申请号 JP19850000804 申请日期 1985.01.09
申请人 TOSHIBA CORP 发明人 SHIMADA OSAMU;SAKUMA HISASHI
分类号 H01L31/04;H01L21/205 主分类号 H01L31/04
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