| 摘要 |
PURPOSE:To obtain the titled developer having the lowest swelling property during developing, and a good resolution property, without remaining a fine resist, by incorporating acetone or methyl ethyl ketone as a main component to the titled resist. CONSTITUTION:The titled developer is applied to a resist image forming method in which the resist material composed of a mixture of polymethoxystyrene and polystyrene having a chloromethyl group makes insoluble by irradiating an electron ray, an X ray, an infra UV ray or an ion beam, and by dissolving out an unirradiated part and removing said part to form a resist image, and consists of a solution comprising acetone or methyl ethyl ketone as a main component. Acetone or methyl ethyl ketone elutes the unirradiated part without remaining said part, and makes a less swelling during developing. Therefore, as the resist image is formed without remaining any resist residue of the unirradiated part, acetone or methyl ethyl ketone may be independently used. The swelling may be further depressed by mixing a solvent which is poor in the solubility, for example, isopropyl alcohol. |
