发明名称 LASER ETCHING METHOD AND ITS APPARATUS
摘要 PURPOSE:To facilitate the discharge of a reaction product, etc. and to increase the efficiency and the rate of working by feeding an etching soln. to the surface of an object to be worked in a direction intersecting to the surface to be worked and by irradiating a laser beam on the surface to be worked in the same direction. CONSTITUTION:An object 12 to be worked is immersed in an etching soln. 19 filled into a vessel 10 so that the surface to be worked is held in a direction intersecting to the bottom of the vessel 10. The etching soln. 19 is fed to the surface to be worked in a direction intersecting to the surface to be worked, and at the same time, a laser beam L is irradiated on the surface to be worked in the same direction.
申请公布号 JPS61159581(A) 申请公布日期 1986.07.19
申请号 JP19850000337 申请日期 1985.01.08
申请人 TOSHIBA CORP 发明人 MORITA NOBORU;ISHIDA SHUICHI
分类号 C23F4/04 主分类号 C23F4/04
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