METHOD FOR CLEANING SUBSTRATE FOR ELECTROPHOTOGRAPHIC SENSITIVE BODY

摘要

PURPOSE:To attain a high degree of cleaning and to prevent reduction in the performance of a photosensitive layer when the surface of an Al-base substrate is cleaned by etching with an aqueous alkali soln., by specifying the weight of the material of the substrate surface removed in the etching stage. CONSTITUTION:When an electrophotographic sensitive body is manufactured, the surface of an Al-base substrate for the sensitive body is cleaned by etching with an aqueous alkali soln. The weight of the material of the substrate surface removed in the etching stage is regulated to 1-50mg/dm<2>.