发明名称 ION PROCESSOR
摘要 PURPOSE:To execute ion processing suitable for microminiaturization of surface by providing an electrode which shows corona discharge against a work to be processed in the vicinity of said work and neutralizing the surface of work with charged particles of polarity opposed to the charge accumulated at said surface of the work. CONSTITUTION:When a high voltage is applied across an electrode 15 consisting of a metal line arranged within the plane parallel to the processing plane of a plate 6 to be processed and said plate 6, the corona discharge occurs and thereby negative ions spread. The negative ions generated by corona discharge of electrode 15 are not reactive ion because it is composed of the neutal gas molecules with adhession of electron and therefore such ion has a small kinetic energy. Therefore, these negative ions are attracted to the outside of ion processor and exhausted after neuralizing the surface charges. Here, when an AC voltage is applied to the electrode 15 and the ion of opposed polarity and the ion of the same polarity are alternately supplied and amount of such ions supplied is gradually reduced. Thereby, the residual charges of the plate to be processed can be eliminated almost perfectly.
申请公布号 JPS61156625(A) 申请公布日期 1986.07.16
申请号 JP19840280656 申请日期 1984.12.27
申请人 FUJI ELECTRIC CO LTD 发明人 NAGAO YASUAKI
分类号 H01J37/08;B23K15/00;H01J27/08 主分类号 H01J37/08
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