| 摘要 |
PURPOSE:To stabilize the performance of a resist and to obtain the resist having the low toxicity by applying the copolymer resist composed of a methacrylic acid ester having an aromatic ring and a methacrylic acid, and (a) a specific acetic acid ester or a specific ketone and (b) one or more of a specific fatty alcohol and a specific hydrocarbon. CONSTITUTION:The copolymer of the methacrylic acid ester and the methacrylic acid contains 8-25wt% the methacrylic acid. The methacrylic acid ester having the aromatic ring is comprised of phenyl methacrylate, a halogen substd. naphthyl methacrylate, a halogen substd. anthryl methacrylate. The acetic acid ester having 5-8C as a component (a) is comprised of acetic acid propylate, acetic acid hexylate. The ketone having 4-8C is comprised of methyl ethyl ketone and methyl isobutyl ketone. The fatty alcohol having 3-5C as a component (b) is comprised of isopropanol and butanol and the hydrocarbon having 6-9C is comprised of hexane and octane. |
