| 摘要 |
PURPOSE:To provide a dense film having superior corrosion resistance and suitable for a film separation technique at a low cost by exposing an Al film to an atmosphere of plasma contg. oxygen to form crystalline or amorphous Al oxide in the surface layer part of the film. CONSTITUTION:Metallic Al 4 put in a crucible 3 is vacuum-deposited on a support sheet 5 in a film forming chamber 1 to form an Al film 6. This film 6 is transferred to a plasma oxidation treatment chamber 2, where high frequency current is supplied between the 1st and the 2nd discharge electrodes 7, 8 from a high frequency power source 9. At the same time, gaseous oxygen is introduced from a gas introducing pipe 10. Activated oxygen is produced in plasma, and a chemical reaction of oxygen with metallic Al of the film 6 proceeds, forming crystalline or amorphous Al oxide in at least the surface layer part of the film 6. The thickness of the film 6 is regulated to about 0.1-100mum.
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