发明名称 Photovoltaic imaging for large area semiconductors
摘要 An imaging system for detecting recombination center defects in a semiconductor wafer in which an oxidized wafer is pre-treated by charging the oxide in a corona discharge and then passing the charged wafer below a stationary bifurcated electrode. A focused laser beam is scanned between the arms of the bifurcated electrode and along its length as the wafer is slowly moved transversely to the direction of laser scanning. The signal from the bifurcated electrode is displayed in an imaging system, one axis of which is synchronized to the laser scanning and the other axis is synchronized to the movement of the wafer.
申请公布号 US4599558(A) 申请公布日期 1986.07.08
申请号 US19830561364 申请日期 1983.12.14
申请人 IBM 发明人 CASTELLANO, JR., ANTHONY J.;DISTEFANO, THOMAS H.;OLYHA, JR., ROBERT S.
分类号 G01N21/88;G01N21/956;G01N27/00;G01R31/265;G01R31/308;H01L21/66;(IPC1-7):G01R31/26 主分类号 G01N21/88
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