发明名称 Photolabile blocked surfactants and compositions containing the same
摘要 Surfactants which are blocked against surfactant action (identified herein as "photolabile blocked surfactants") by a photolabile protective or masking group but which, on exposure to actinic radiation, become unblocked are provided. Coating compositions in which surfactant is formed on irradiation are provided by blending the photolabile blocked surfactant with polymeric film-forming materials. Compositions containing the photolabile blocked surfactants are useful when employed as protective coatings on various substrates or as the adhesive in a pressure sensitive adhesive tape. Although initially well adhering to a substrate, such compositions may be readily removed from the substrate following exposure of the same to suitable radiation which unblocks the surfactant to permit it to regain its surfactant activity.
申请公布号 US4599273(A) 申请公布日期 1986.07.08
申请号 US19840608954 申请日期 1984.05.10
申请人 MINNESOTA MINING AND MANUFACTURING CO. 发明人 EIAN, GILBERT L.;TREND, JOHN E.
分类号 B01F17/00;C09D5/00;C09D7/02;C09J7/02;(IPC1-7):C08F8/00;B32B27/36;B32B27/30;B05D3/06 主分类号 B01F17/00
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