| 摘要 |
PURPOSE:To etch in uniform reaction gas atmosphere by providing flow rate regulating means in reactive gas intake and exhaust tubes. CONSTITUTION:Flow rate regulators 6-1, 6-2, 6-3, 6-4 are respectively provided in gas intake tubes 3-1, 3-2, 3-3, 3-4. Flow rate regulators 7-1, 7-2, 7-3 are respec tively provided in gas exhaust tubes 4-1, 4-2, 4-3. The reaction gas in a reaction chamber 2 is equalized by suitably regulating the regulators 6-1, 6-2, 6-3, 6-4, 7-1, 7-2, 7-3. |
