发明名称 SEMICONDUCTOR DEVICE
摘要 A semiconductor device includes a diffusion layer in the semiconductor substrate thereof; and an insulation layer is formed on the semiconductor substrate and is provided with a contact window therein, so as to electrically connect a conductive metal layer with the diffusion layer composed of Si atoms as a base material. A Si atom supplier is formed close to the contact window at the area where the Si atoms diffuse into the conductive metal layer. Preferably, the Si atom supplier comprises a dummy contact window similar to the above-mentioned real contact window.
申请公布号 DE3174745(D1) 申请公布日期 1986.07.03
申请号 DE19813174745 申请日期 1981.12.15
申请人 FUJITSU LIMITED 发明人 MASUNAGA, HIKOTARO;EMORI, SHINJI
分类号 H01L27/04;H01L21/285;H01L21/822;H01L29/40;H01L29/41;H01L29/8605;(IPC1-7):H01L29/40 主分类号 H01L27/04
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