发明名称 |
SEMICONDUCTOR DEVICE |
摘要 |
A semiconductor device includes a diffusion layer in the semiconductor substrate thereof; and an insulation layer is formed on the semiconductor substrate and is provided with a contact window therein, so as to electrically connect a conductive metal layer with the diffusion layer composed of Si atoms as a base material. A Si atom supplier is formed close to the contact window at the area where the Si atoms diffuse into the conductive metal layer. Preferably, the Si atom supplier comprises a dummy contact window similar to the above-mentioned real contact window. |
申请公布号 |
DE3174745(D1) |
申请公布日期 |
1986.07.03 |
申请号 |
DE19813174745 |
申请日期 |
1981.12.15 |
申请人 |
FUJITSU LIMITED |
发明人 |
MASUNAGA, HIKOTARO;EMORI, SHINJI |
分类号 |
H01L27/04;H01L21/285;H01L21/822;H01L29/40;H01L29/41;H01L29/8605;(IPC1-7):H01L29/40 |
主分类号 |
H01L27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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