| 摘要 |
PURPOSE:To obtain a lead frame having no problem at the following processing, by a method wherein chemical etching of nonisotropic is applied making resist as a mask which was left at the prescribed pattern on one side of an alloy plate, and said alloy plate is removed up to another surface. CONSTITUTION:Resists 12 are left at the prescribed pattern on one side of the alloy plate 1. Next, the RIE is performed, and etching is made to rapidly progress only to the vertical direction to the exposed surface, and even the other surface is removed without almost generating side surface etching. By this constitution, there is no generation of metal burr, and also there is no generation of irregular shaped section and the lead frame with good accuracy can be obtained. |
