| 摘要 |
PURPOSE:To enable a formation of a fine pattern by preparing the titled composition from a resist comprising a mixture of cis-(1,3,5,7-tetrahydroxyl)-1,3,5,7- tetraphenylcyclotetrasi-loxane and a specific polysilsesquioxane and a phenolic resin soluble to an alkaline aqueous solution. CONSTITUTION:The resist is composed of 5-100wt% prescribed mixture and the phenol resin soluble to the alkaline aqueous solution. Said mixture consists of (A) cis-(1,3,5,7-tetrahydroxy)-1,3,5,7-tetraphenylcyclotetrasil-oxane and (B) polysilsesquioxane shown by the formula wherein R1 is a phenyl group and/or 1-4C alkyl group, a ratio of the phenyl group/the alkyl group is >=1, R2 is at least one of an element or a substituent selected from the groups of a hydrogen atom, the phenyl and 1-4C alkyl groups, the hydrogen atom is >=1/2 the whole R2 group.
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