| 摘要 |
PURPOSE:To prevent the contamination of a decomposition liquid and to increase the concn. thereof by decomposing a solid sample consisting of a thin film or thin sheet in a hermetic vessel consisting of a fluororesin, etc. CONSTITUTION:A device 10 for dissolving the thin film or thin sheet is constituted of a dissolving vessel 1 consisting of a fluororesin or synthetic quartz and having a cover body 2 and a heating vessel 7 provided with a plate heater 6 for heating. The dissolving liquid 5 consisting of a hydrofluoric acid is contained at about 1ml into the base of the vessel 1. A semiconductor substrate 3 formed with the thin film 4 consisting of an oxide film having, for example, about 5,000Angstrom thickness on the surface is installed in the vessel 1 in such a manner that the bottom thereof is dipped in the liquid 5. The vessel 1 is then contained into a heating vessel 7 and is heated to evaporate the liquid 5 by a heater 6 by which the film 4 is decomposed and a decomposition liquid 8 is formed. The liquid 8 is then taken out of the vessel 7 and is allowed to cool. The contamination of the liquid 8 is prevented in the above-mentioned manner and the liquid 8 having the high concn. is obtd. |
