| 摘要 |
PURPOSE:To obtain a novel copolymer containing an epoxy group and a getero ring on the side chain, useful as a base resin for grafting, having improved sensitivity to high-energy rays and improved dry etching resistance, by copolymerizing specific monomers in the presence of a polumerization initiator. CONSTITUTION:Monomers shown by the formula I and formula II [R1 is H, 1-6C alkyl, or halogen; W, X, Y, and Z are H, halogen, CN, 1-6C (halogenated)alkyl, 6-30C (substituent)aryl, etc.] are copolymerized in the pres ence of a polymerization initiator such as benzoyl peroxide, alpha, alpha'- azobisisobutylronitrile, etc., to give a novel linear copolymer consisting of repeating units shown by the formula III and formula IV, having 500-5,000,000 number-average molecular weight. Or, a copolymer consisting of repeating structural units shown by the formula V and VI is treated with an oxidizing agent, to give the aimed copolymer.
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