| 摘要 |
PURPOSE:To facilitate formation of a mask by forming plural X-ray absorption patterns on the same plane or in plural layers on an X-ray transmitting layer by using plural materials different from each other in X-ray absorbance in each wavelength. CONSTITUTION:The surface of a silicon substrate 1 is coated with a resin monomer and heat treated to form a polyimide film 8 serviceable as the X-ray transmitting layer, and a frame member 9 is bonded to the film 8, the silicon substrate 1 is removed by etching or the like, an X-ray absorption pattern 10 made of Si3N4 is formed by attaching an Si3N4 film to the film 8 and etching it. Then, a resist pattern 11 in complementary relation to a prescribed pattern is formed by coating the pattern 10 with a resist and irradiating it with an electron beam, and further, a metal 5 of an X-ray absorber is attached onto the pattern 11, and when the pattern 11 is peeled, the second X-ray absorption pattern 12 is formed on the first pattern 10, and thus, an exposure mask is formed. |
