| 摘要 |
PURPOSE:To obtain a novel copolymer containing a double bond and a hetero ring, useful as a base resin for grafting, having improved sensitivity to high- energy rays and improved dry etching resistance, by copolymerizing specific monomers in the presence of a polymerization initiator. CONSTITUTION:Monomers shown by the formula I and formula II [R1 is H, 1-6C alkyl, or halogen; W, X, Y, and Z are H, halogen, CN, 1-'C(halogenated) alkyl, 6-30C (substituted) aryl, etc.] in the presence of an anionic polymeriza tion initiator (e.g., ethyllithium, etc.) preferably at -70-100 deg.C for 0.5 minutes - 72 hours, to give a compolymer consisting of repeating structural units shown by the formula III and IV, having 500-5,000,000 number-average molecular weight.
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