| 摘要 |
PURPOSE:To surely obtain a fine pattern with a good dimensional stability by providing a film contg. a specific sensitive diazonium salt on a resist film, and by exposing the obtd. film with a specific visible ray to form a pattern. CONSTITUTION:The sensitive film contg. a sensitive diazonium salt is provided on a resist film followed by forming a pattern with a ray capable of exposing both the resist and the diazonium salt. The diazonium salt comprises the compd. shown by formula I or II wherein R1 and R2 are each hydrogen atom, halogen atom, alkyl, alkenyl or alkoxy group or group shown by formula III, R3-R8 are each hydrogen atom, halogen atom, alkyl or alkenyl group, X is anion capable of forming the diazonium salt. By forming the prescribed pattern by the visible ray having >=400nm wavelength, a shade ability against UV makes large, and a fading rate due to light may be allowed to be coincide with the sensitivity of the resist so as to obtain a complete transparent film after fading, and to surely obtain the fine pattern having the good dimensional stability. |
