发明名称 HIP PROCESS FOR SUBLIMABLE SUBSTANCE
摘要 PURPOSE:To suppress the sublimation of the raw material effectively, and to obtain a beautiful crystal free from surface roughness, by putting the material to be treated in a flame-retardant powder filled in a sample case, and carrying out the HIP treatment of the material. CONSTITUTION:The sample case 1 is filled with hardly sintering powder 2, and a material 3 to be subjected to HIP treatment is put into the powder 2. The case containing the material is introduced into an HIP apparatus, and heated at a high temperature under high pressure of inert gas. The material 3 to be treated is a crystal to form an optical part, e.g. ZnS, ZnSe, etc., which is an easily sublimable substance having high vapor pressure. The hardly sintering powder is e.g. Al2O3, SiO2, etc. Since the material 3 is surrounded by the powder, the convection of the gas is prevented, the partial pressure of the component gas near the material is increased, and the further sublimation of the component gas from the material can be suppressed. Since no further progress is made in the sublimation of the material, the surface roughening of the material caused by sublimation can be prevented.
申请公布号 JPS61141605(A) 申请公布日期 1986.06.28
申请号 JP19840261592 申请日期 1984.12.10
申请人 SUMITOMO ELECTRIC IND LTD 发明人 KIKUCHI MOTOHARU;SHIBATA KENICHIRO
分类号 C01G9/08;B30B11/00;C01B19/04;G02B1/02 主分类号 C01G9/08
代理机构 代理人
主权项
地址