发明名称 SURFACE TREATMENT DEVICE
摘要 PURPOSE:To generate uniform and high-density plasma by positioning a pair of non-grounded electrodes connected respectively to separate power sources to face each other in a vacuum vessel, generating a magnetic field along both electrodes and limiting the pseudo-cycloid motion of electrons. CONSTITUTION:Prescribed mixing ratios of treating gases are introduced from cylinders 23-24 into the vacuum vessel 11 and the inside of the vessel is evacuated by a vacuum pump 30 to the prescribed pressure. DC current is passed to coils 21, 22 to generate a magnetostatic field in the direction B parallel with the opposed surfaces 12a, 13a of the non-grounded electrodes 12, 13. Independent high-frequency electric powers are supplied in this state to the electrodes 12, 13 from the high-frequency power sources 18, 19 to induce the pseudo-cycloid motion of electrons near the respective surfaces 12a, 13a. The pseudo-cycloid motion is prohibited or limited by insulators 14, 15 and the side wall of the vessel 11 in the front of the above-mentioned motion. The plasma is increased in density and the density distribution is made uniform in the front of the prohibited or limited motion direction.
申请公布号 JPS61139670(A) 申请公布日期 1986.06.26
申请号 JP19840261492 申请日期 1984.12.11
申请人 ANELVA CORP 发明人 KIN KIYOUSHIYOKU;OOEN UIRUKINSON
分类号 C23C16/50;C23C14/35;C23F4/00 主分类号 C23C16/50
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