| 摘要 |
<p>A method for forming a resist pattern comprises the steps of coating a resist on a substrate (12), baking the resist, selectively radiating electromagnetic waves or particle rays onto a surface of the resist, and developing the resist. The method further comprises, after the baking step and before the developing step, the step of cooling the resist in such a manner that a temperature control plate (8) is disposed parallel to and adjacent to the substrate (12).</p> |
