| 摘要 |
PURPOSE:To make it possible to generate an ion beam safely and stably, by feeding an ion source material to an ion emitting part as making this ion source material not to contact with air, and as controlling the feeding quantity of this ion source material. CONSTITUTION:A capillary 5 and an emitter chip 7 are heated to 50 deg.C by a heater 6 for heating the capillary, and a reactive metal Cs ampoule 1 is cut in a vacuum ampoule keeping chamber 2. This reactive metal Cs is evaporated through heating the chamber 2 to 100 deg.C by a heater 3 for heating the ampoule keeping chamber, fed to the capillary 5, fed to the top of the chip 7, and after that, field emission ion is drawn by applying the drawing voltage to electrodes 8. At this time, the feeding quantity of the metal Cs toward the capillary 5 is controlled through controlling the evaporation quantity of the metal Cs by the heater 3. In this way, a stable metal Cs ion beam can be got, and stable analysis can be performed. |
