发明名称 |
Thin-film permanent magnet and method of producing the same |
摘要 |
A thin-film permanent magnet which is made of a Co - Pt alloy containing 5-35 atomic-% of Pt. This thin-film permanent magnet can be readily produced by a sputtering method in which the ultimate pressure before the introduction of a sputtering gas is made 5x10-7-1x10-4 Torr. Without any heat treatment, it has a coercivity of 2,000 Oe at the maximum and a remanence of about 8,000-about 18,000 G.
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申请公布号 |
US4596646(A) |
申请公布日期 |
1986.06.24 |
申请号 |
US19830469105 |
申请日期 |
1983.02.23 |
申请人 |
HITACHI, LTD. |
发明人 |
KITADA, MASAHIRO;YAMAMOTO, HIROSHI;SUENAGA, MASAHIDE;SHIMIZU, NOBORU |
分类号 |
C22C1/00;C22C19/07;C23C14/14;C23C14/34;C23C14/36;G11B5/66;H01F10/16;H01F41/18;(IPC1-7):C23C14/00 |
主分类号 |
C22C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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