发明名称 Thin-film permanent magnet and method of producing the same
摘要 A thin-film permanent magnet which is made of a Co - Pt alloy containing 5-35 atomic-% of Pt. This thin-film permanent magnet can be readily produced by a sputtering method in which the ultimate pressure before the introduction of a sputtering gas is made 5x10-7-1x10-4 Torr. Without any heat treatment, it has a coercivity of 2,000 Oe at the maximum and a remanence of about 8,000-about 18,000 G.
申请公布号 US4596646(A) 申请公布日期 1986.06.24
申请号 US19830469105 申请日期 1983.02.23
申请人 HITACHI, LTD. 发明人 KITADA, MASAHIRO;YAMAMOTO, HIROSHI;SUENAGA, MASAHIDE;SHIMIZU, NOBORU
分类号 C22C1/00;C22C19/07;C23C14/14;C23C14/34;C23C14/36;G11B5/66;H01F10/16;H01F41/18;(IPC1-7):C23C14/00 主分类号 C22C1/00
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