| 摘要 |
<p>PURPOSE:To make an etching preventive layer in the nature of electrical insulation unnecessary by etching a heating resistor made of a titanium carbide, silicon and oxygen with a solution in which ammonia water and hydrogen peroxide solution are mixed as the main components, thereby forming a pattern. CONSTITUTION:On a so-called glazed alumina substrate 11 consisting of an alumina substrate 9 and a glass glazed layer 10 formed thereon, a TiC-SiO2 thin film heating resistor 12 is formed as a heating resistor made of a titanium carbide, silicon and oxygen. A first conductive thin film layer 13 of Cr and a second conductive thin film layer 14 of Au or Cu are formed thereon in a manner that they are sequentially laminated, and a wiring pattern is formed. At this time, the TiC-SiO2 thin film heating resistor 12 is etched with a solution in which ammonia water and hydrogen peroxide solution are mixed as the main components. With this, a good pattern can be formed, the glass glazed layer 15 is not eroded, and it is thus possible to form a highly reliable pattern. Therefore, it is unnecessary to form an etching preventive layer in the nature of electrical insulation.</p> |
