发明名称 APPARATUS FOR LIQUID PHASE EPITAXY
摘要 PURPOSE:To enable the baking of a melted liquid and uniform thickness by providing a pressing lid which has plural through holes on the melted liquid. CONSTITUTION:The thickness of a melted liquid 3 is made nearly constant l3(l1<l3<l2) at the periphery and the center by providing a pressing lid 5 which has a through hole 4 on the melted liquid 3. Impurity such as an oxide on the surface of the melted liquid 3 is brought into contact with an external hydrogen reduction atmosphere through the hole 4 and baking effect is not damaged. By using the pressing lid having the through holes, the projection of the melted liquid due to surface tension is pressed and there is an effect of enabling the thickness of the melted liquid nearly uniform. Part of the surface of the melted liquid is also exposed in the atmosphere by the through hole and there also is an effect of the melted liquid being baked.
申请公布号 JPS61135117(A) 申请公布日期 1986.06.23
申请号 JP19840257817 申请日期 1984.12.06
申请人 NEC CORP 发明人 SUGANO HIKARI
分类号 H01L21/20;H01L21/208;(IPC1-7):H01L21/208 主分类号 H01L21/20
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