| 摘要 |
PURPOSE:To contrive uniform distribution of temperature in a susceptor and a wafer by providing the circular disk type susceptor for heat retaining to place the wafer to be treated making a susceptor table at the center of the susceptor the same quality with the susceptor. CONSTITUTION:A table 7-1 which has the same quality with a susceptor 8 and a support and rotation shaft 7-2 for the table are provided at the center of the susceptor 8. The table is as if the area of the susceptor is increased and heat retaining effect is increased in high frequency induction heating reducing heat dissipation. That is, the susceptor can be made nearly uniform characteristics in both temperature rising and falling. By utilizing the high frequency induction heating effectively in such a way, inner circumference heat dissipation is prevented, the adjustment to obtain the optimum temperature distribution is made extremely easy and the improvement of the operating rate of the device, saving of a material and the improvement of quality can be contrived. |
