发明名称 MASK STRUCTURE FOR LITHOGRAPHY
摘要 <p>PURPOSE:To enhance adhesion of a mask-holding thin film to holding bases by bonding said thin film to the inside and outside bases at a position lower than the uppermost pat of the inside base so as to bring the good heat- conductive layer of the film into heat-conductive contact with the good heat- conductive base. CONSTITUTION:The mask members 1 is formed in a desired pattern in contact with the good heat-conductive layer 2a of the mask-holding thin film 2. The peripheral border of the film 2 is bonded to the circular holding bases 3, 5 with an adhesive 4. This is not applied to the uppermost flat face 3a of the inside base 3, but only on the face 3b intersecting the face 3a at an angle of thetaat the outside of it. The underside slant face 5b of the base 5 is in parallel to the face 3b, and coated with the adhesive 4. The uppermost end face 5a of the base 5 is located in most cases below that 3a of the base 3. The outside base 5 is made of a good heat-conductive material.</p>
申请公布号 JPS61134764(A) 申请公布日期 1986.06.21
申请号 JP19840257961 申请日期 1984.12.06
申请人 CANON INC 发明人 MATSUDA KEIKO;SHIBATA HIROFUMI;KATO HIDEO
分类号 G03F1/00;G03F1/22;H01L21/027 主分类号 G03F1/00
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