发明名称 DRY ETCHING DEVICE
摘要 PURPOSE:To prevent effectively the corrosion of a material to be treated owing to the reaction with the atm. air in a dry etching device by connecting integrally a post treatment chamber to the rear stage side of an etching chamber so that the post treatment can be executed right after the end of the etching. CONSTITUTION:The material to be treated is lifted by the rise of a pusher pin 7 and a conveyor 9 is positioned below the material to be treated via a gate valve 18c when the treatment of the material to be treated ends in the etching chamber 2. The pin 7 is lowered to place the material to be treated on the conveyor 9 and said material is conveyed to an unloading chamber 3. The material to be treated is then fed above a pusher pin 10 and the material to be treated is lifted by the pin 10 and is placed on a belt conveyor 11, by which the material is conveyed to a heat treatment chamber 5. A hot plate 13 is raised to carry the material to be treated when the material to be treated is positioned below a nozzle 14, then the air heated by a heater 17 is blown from the nozzle 14 toward the material to be treated by which the material to be treated is dried. The material is then fixed to a chuck 22 for rinsing and is subjected to rinsing; thereafter the material is conveyed to an outlet side cassette 29.
申请公布号 JPS61133388(A) 申请公布日期 1986.06.20
申请号 JP19840253591 申请日期 1984.11.30
申请人 TOKUDA SEISAKUSHO LTD;TOSHIBA CORP 发明人 JO HIDETAKA;HAZAMANO SHIGEKI;SHIBAGAKI MASAHIRO
分类号 C23F4/00;C23F1/08 主分类号 C23F4/00
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