| 摘要 |
PURPOSE:To measure a degree of cleaning without contaminating an IC wafer and a cleaning tank by suspending a resistance sensor on the outside wall of the cleaning tank, and measuring the degree of cleaning by receiving a overflowed liquid. CONSTITUTION:A cleaning water 3 inputted from a lower input port 2 of a cleaning tank 1 overflows from the upper end of the side wall. A part of the overflowed cleaning water is led into a resistance sensor 4, a resistance value is measured, calculated by a control device 5, and a degree of cleaning is calculated. The resistance sensor 4 is suspended on the outside wall of the cleaning tank 1, therefore, it does not occur that an IC wafer and the cleaning tank 1 are contaminated by the resistance sensor 4. |
