| 摘要 |
PURPOSE:To assure uniformity with the introduction of an etching gas alone and to execute sure and uniform etching by forming a coating material for an electrode of a material contg. either carbon or oxygen. CONSTITUTION:Two electrodes 3, 7 are disposed to face each other in a vacuum vessel 1 of a plasma etching device. A material to be treated is fixed to the lower electrode 7 and a gas ejection port 8 which supplies an etching gas to the inside of the vessel 1 is provided to the electrode 3. The surface of the electrode 7 to be imposed with material to be treated is coated with a coating member 2 consisting of a material contg. either carbon or oxygen. The surface is coated with, for example, polyester, hydrocarbon, etc.
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